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Characterization of ZnO and ZnO: Al films deposited by MOCVD on oriented and amorphous substrates.
Maria Elena Fragala
Graziella Malandrino
Published in:
Microelectron. J. (2009)
Keyphrases
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thin film
film thickness
chemical vapor deposition
silicon nitride
high density
grain size
electron microscopy
room temperature
multi layer
computer vision
databases
learning algorithm
artificial intelligence
learning environment
multi agent systems