Control of design specific variation in etch-assisted via pattern transfer by means of full-chip simulation.
Valeriy SukharevAra MarkosianArmen KteyanLevon ManukyanNikolay KhachatryanJun-Ho ChoyHasmik LazaryanHenrik HovsepyanSeiji OnoueTakuo KikuchiTetsuya KamigakiPublished in: ISQED (2009)
Keyphrases
- circuit design
- high speed
- simulation environment
- case study
- user interface
- chip design
- domain specific
- single chip
- functional verification
- pattern matching
- intelligent control
- design procedure
- physical design
- control program
- real time control
- simulation tool
- design methodology
- power electronics
- real time
- application specific
- knowledge transfer
- simulation model
- mathematical model
- low cost
- high level
- neural network