MILP-Based Optimization of 2-D Block Masks for Timing-Aware Dummy Segment Removal in Self-Aligned Multiple Patterning Layouts.
Peter DebackerKwangsoo HanAndrew B. KahngHyein LeePraveen RaghavanLutong WangPublished in: IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. (2017)