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Plasma-etching processes for ULSI semiconductor circuits.

Michael ArmacostPeter D. HohRichard WiseWendy YanJeffrey J. BrownJohn H. KellerGeorge A. KaplitaScott D. HalleK. Paul MullerMunir D. NaeemSenthil SrinivasanHung Y. NgMartin GutscheAlois GutmannBruno Spuler
Published in: IBM J. Res. Dev. (1999)
Keyphrases
  • plasma etching
  • low density
  • thin film
  • high density
  • high speed
  • database
  • analog vlsi
  • data sets
  • website
  • decision trees
  • database systems
  • query processing
  • computational models
  • low power
  • asynchronous circuits