Plasma-etching processes for ULSI semiconductor circuits.
Michael ArmacostPeter D. HohRichard WiseWendy YanJeffrey J. BrownJohn H. KellerGeorge A. KaplitaScott D. HalleK. Paul MullerMunir D. NaeemSenthil SrinivasanHung Y. NgMartin GutscheAlois GutmannBruno SpulerPublished in: IBM J. Res. Dev. (1999)