I/O thick oxide device integration using Diffusion and Gate Replacement (D&GR) gate stack integration.

Romain Ritzenthaler Tom Schram M. J. Cho Anda Mocuta Naoto Horiguchi Aaron Voon-Yew Thean Alessio Spessot Christian Caillat Marc Aoulaiche Pierre Fazan K. B. Noh Y. Son

Published in: ICICDT (2015)

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