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In-Situ Plasma Monitoring during the Pulsed Laser Deposition of Ni60Ti40 Thin Films.

Nicanor CimpoesuSilviu GurluiGeorgiana BulaiRamona CimpoesuViorel Puiu PaunStefan-Andrei IrimiciucMaricel Agop
Published in: Symmetry (2020)
Keyphrases
  • thin film
  • chemical vapor deposition
  • plasma etching
  • high density
  • real time
  • short circuit
  • monitoring system
  • multi layer
  • grain size
  • room temperature
  • film thickness
  • silicon nitride
  • white light interferometry