Study of the DC Performance of Fabricated Magnetic Tunnel Junction Integrated on Back-End Metal Line of CMOS Circuits.
Fumitaka IgaMasashi KamiyanagiShoji IkedaKatsuya MiuraJun HayakawaHaruhiro HasegawaTakahiro HanyuHideo OhnoTetsuo EndohPublished in: IEICE Trans. Electron. (2010)