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nMISFETs after post deposition annealing.

Jin-Aun NgNobuyuki SugiiKuniyuki KakushimaParhat AhmetKazuo TsutsuiTakeo HattoriHiroshi Iwai
Published in: IEICE Electron. Express (2006)
Keyphrases
  • thin film
  • simulated annealing
  • machine learning
  • neural network
  • decision making
  • high level
  • plasma etching