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Resistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography.
Luis Guillermo Villanueva
Oscar Vazquez-Mena
Cristina Martin-Olmos
Veronica Savu
Katrin Sidler
Juergen Brugger
Published in:
Micromachines (2013)
Keyphrases
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electron beam
electron beam lithography
x ray
integrated circuit
semiconductor devices
design parameters
neural network
high quality
data model
high density
machine learning
artificial intelligence
decision making
pairwise
low cost
computer simulation