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Photoluminescence properties of thin-film SiOxCy deposited by O-Cat CVD technique using MMS and TEOS.

Manmohan JainJ. R. Ramos-SerranoAteet DuttYasuhiro Matsumoto
Published in: CCE (2020)
Keyphrases
  • thin film
  • electron microscopy
  • chemical vapor deposition
  • silicon nitride
  • high density
  • film thickness
  • short circuit
  • multi layer
  • grain size
  • database systems
  • x ray