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On the futility of thermal through-silicon-vias.

Chung-Han ChouNien-Yu TsaiHao YuYiyu ShiJui-Hung ChienShih-Chieh Chang
Published in: VLSI-DAT (2013)
Keyphrases
  • electrical properties
  • high density
  • integrated circuit
  • data center
  • low cost
  • multiscale
  • high speed
  • infrared