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Luminescent Silicon Oxycarbide Thin Films via Hot-wire CVD using Tetraethyl Orthosilicate: Role of the Chamber Pressure and Post-deposition Annealing.
J. R. Ramos-Serrano
Yasuhiro Matsumoto
Crisóforo Morales
Published in:
CCE (2018)
Keyphrases
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thin film
plasma etching
chemical vapor deposition
high density
solar cell
short circuit
database
high speed
multi layer
grain size
film thickness
machine learning
room temperature
learning algorithm
feed forward
white light interferometry