Taguchi method-ANN integration for predictive model of intrinsic stress in hydrogenated amorphous silicon film deposited by plasma enhanced chemical vapour deposition.
T. B. AsafaNaji TabetS. A. M. SaidPublished in: Neurocomputing (2013)
Keyphrases
- predictive model
- thin film
- chemical vapor deposition
- film thickness
- artificial neural networks
- plasma etching
- high density
- silicon nitride
- historical data
- neural network
- prediction model
- electron microscopy
- decision trees
- classification rules
- permalloy films
- probabilistic model
- predictive analytics
- multi layer
- low density
- genetic algorithm
- fuzzy logic
- room temperature
- association rules
- machine learning
- support vector
- pairwise
- classification models
- regression model