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Effects of deposition pressure on the microstructural and optoelectrical properties of B-doped hydrogenated nanocrystalline silicon (nc-Si: H) thin films grown by hot-wire chemical vapor deposition.

Peiqing LuoZhibin ZhouYoujie LiShuquan LinXiaoming DouRongqiang Cui
Published in: Microelectron. J. (2008)
Keyphrases
  • chemical vapor deposition
  • thin film
  • room temperature
  • high density
  • thermal conductivity
  • solar cell
  • plasma etching
  • short circuit
  • white matter
  • grain size
  • multi layer
  • ccd camera