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Post-Layout Perturbation towards Stitch Friendly Layout for Multiple E-Beam Lithography.

Sudipta PaulPritha BanerjeeSusmita Sur-Kolay
Published in: ICCD (2017)
Keyphrases
  • electron beam
  • data sets
  • case study
  • neural network
  • feature selection
  • image processing
  • website
  • search algorithm
  • digital libraries
  • artificial neural networks
  • hidden markov models
  • x ray
  • cross section
  • spatial layout