Post-Layout Perturbation towards Stitch Friendly Layout for Multiple E-Beam Lithography.

Sudipta Paul Pritha Banerjee Susmita Sur-Kolay

Published in: ICCD (2017)

Keyphrases

electron beam
data sets
case study
neural network
feature selection
image processing
website
search algorithm
digital libraries
artificial neural networks
hidden markov models
x ray
cross section
spatial layout