An inverse-distance weighting genetic algorithm for optimizing the wafer exposure pattern for enhancing OWE for smart manufacturing.
Hung-Kai WangChen Fu ChienPublished in: Appl. Soft Comput. (2020)
Keyphrases
- genetic algorithm
- semiconductor manufacturing
- manufacturing process
- evolutionary algorithm
- binary strings
- distance measure
- wafer fabrication
- pattern detection
- quality control
- fitness function
- pattern matching
- neural network
- similarity measure
- hamming distance
- distance function
- differential evolution
- process control
- manufacturing systems
- multi objective optimization
- genetic programming
- manufacturing processes
- euclidean distance
- ant colony optimization
- distance transform
- tf idf
- integrated circuit
- simulated annealing
- environmental factors
- multi objective
- manufacturing environment