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Standard and self-sustained magnetron sputtering deposited Cu films investigated by means of AFM and XRD.
Artur Wiatrowski
W. M. Posadowski
Grzegorz Józwiak
Jaroslaw Serafinczuk
R. F. Szeloch
Teodor P. Gotszalk
Published in:
Microelectron. Reliab. (2011)
Keyphrases
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electron microscopy
film thickness
electrical properties
magnetic field
permalloy films
computer vision
image sequences
rf sputtering
data sets
neural network
image processing
image segmentation