Towards low damage and fab-compatible top-contacts in MX2 transistors using a combined synchronous pulse atomic layer etch and wet-chemical etch approach.
S. KunduD. H. van DoipTom SchramQuentin SmetsS. BanerjeeBenjamin GrovenDaire CottS. DecosterP. BezardF. LazzarinoK. BanerjeeS. GhoshJ. F. de MamelfePierre MorinCesar J. Lockhart de la RosaInge AsselberghsGouri Sankar KarPublished in: VLSI Technology and Circuits (2023)