Two-dimensional dopant profiling in semiconductor devices by electron holography and chemical etching delineation techniques with the same specimen.
Ulugbek ShaislamovJun-Mo YangJung Ho YooHyun-Sang SeoKyung-Jin ParkChel-Jong ChoiTae-Eun HongBeelyong YangPublished in: Microelectron. Reliab. (2008)
Keyphrases
- electron beam
- semiconductor devices
- integrated circuit
- three dimensional
- computer generated
- field effect transistors
- x ray
- multi dimensional
- packing problem
- physical characteristics
- design parameters
- thin film
- electron beam lithography
- three dimensional objects
- mechanical properties
- parameter tuning
- segmentation method