Graph-Based Subfield Scheduling for Electron-Beam Photomask Fabrication.
Shao-Yun FangWei-Yu ChenYao-Wen ChangPublished in: IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. (2013)
Keyphrases
- electron beam
- integrated circuit
- x ray
- semiconductor devices
- scheduling problem
- design parameters
- scheduling algorithm
- round robin
- parallel machines
- resource allocation
- graph model
- electron beam lithography
- semi supervised
- neural network
- genetic algorithm
- response time
- life sciences
- expert systems
- objective function
- real time