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Effects of impurity concentration, hydrogen plasma process and crystallization temperature on poly-crystalline films obtained from PECVD a-Si: H layers.

Rodolfo Zolá García-LozanoMagali EstradaAntonio Cerdeira
Published in: Microelectron. Reliab. (2003)
Keyphrases
  • chemical vapor deposition
  • thin film
  • high density
  • film thickness
  • grain size
  • case study
  • three dimensional
  • high speed
  • room temperature
  • fermentation process