Novel Fabrication Technology for High Yield Sub-100-nm-Gate InP-Based HEMTs.
Hideaki MatsuzakiTakashi MaruyamaTakatomo EnokiMasami TokumitsuPublished in: IEICE Trans. Electron. (2006)
Keyphrases
- cmos technology
- silicon on insulator
- nm technology
- metal oxide semiconductor
- integrated circuit
- power consumption
- wide range
- low power
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- data processing
- neural network
- rapid development
- high speed
- computer systems
- real world
- parallel processing
- case study
- technological advances
- real time
- thin film transistor
- image processing
- high density
- st century
- key technologies
- database
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- low cost