Advanced semiconductor fabrication process control using dual filter exponentially weighted moving average.
Hyo-Heon KoJihyun KimSang-Hoon ParkJun-Geol BaekSung-Shick KimPublished in: J. Intell. Manuf. (2012)
Keyphrases
- weighted moving average
- process control
- control charts
- semiconductor manufacturing
- statistical process control
- control system
- product quality
- plasma etching
- semiconductor devices
- intelligent control
- manufacturing process
- integrated circuit
- abnormal patterns
- filtering algorithm
- high speed
- cumulative sum
- primal dual
- noise reduction
- artificial neural networks