PREVAIL-Electron projection technology approach for next-generation lithography.
Rajinder S. DhaliwalWilliam A. EnichenSteven D. GolladayMichael S. GordonRodney A. KendallJon E. LiebermanHans C. PfeifferDavid J. PinckneyChristopher F. RobinsonJames D. RockrohrWerner StickelEileen V. TresslerPublished in: IBM J. Res. Dev. (2001)