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On the application of boron and phosphorus heavily doped LPCVD polycrystalline silicon thin films as thermoelectric materials.
Sanja Zonja
Miroslav Ocko
Mile Ivanda
Tomislav Suligoj
Petar Biljanovic
Published in:
MIPRO (2012)
Keyphrases
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thin film
high density
plasma etching
room temperature
solar cell
chemical vapor deposition
high speed
databases
neural network
low cost
grain size