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interfaces by deposition onto plasma-nitrided passivated Ge substrates: Integration issues Ge gate stacks into advanced devices.
S. Lee
J. P. Long
Gerald Lucovsky
J. L. Whitten
H. Seo
J. Lüning
Published in:
Microelectron. Reliab. (2008)
Keyphrases
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thin film
high density
chemical vapor deposition
plasma etching
mobile devices
key issues
liquid crystal displays
topics covered include
user interface
data integration