Evolution of morphological characteristics of Si: H p-i-n structures deposited by plasma on "corning" substrates.
Carlos OspinaAndrey KosarevPublished in: CCE (2015)
Keyphrases
- chemical vapor deposition
- thin film
- high density
- solar cell
- electron microscopy
- silicon nitride
- multiscale
- dynamic characteristics
- plasma etching
- film thickness
- field effect transistors
- mathematical morphology
- information systems
- low density
- room temperature
- data sets
- morphological features
- multi layer
- genetic algorithm