Electromigration failure distributions of dual damascene Cu /low - k interconnects.
A. S. OatesShou-Chung LeePublished in: Microelectron. Reliab. (2006)
Keyphrases
- integrated circuit
- probability distribution
- random variables
- high levels
- data sets
- genetic algorithm
- gaussian distribution
- failure rate
- heavy tailed distributions
- log normal
- statistical distributions
- failure detection
- electron microscopy
- joint distribution
- input output
- bayesian networks
- information systems
- databases