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Reliability and Variability-Aware DTCO Flow: Demonstration of Projections to N3 FinFET and Nanosheet Technologies.

Gerhard RzepaMarkus KarnerOskar BaumgartnerGeorg StrofFranz SchanovskyFerdinand MitterbauerChristian KernstockHui-Wen KarnerPieter WeckxGeert HellingsDieter ClaesZhicheng WuYang XiangThomas ChiarellaBertrand ParvaisJérôme MitardJacopo FrancoBen KaczerDimitri LintenZlatan Stanojevic
Published in: IRPS (2021)
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