Reliability and Variability-Aware DTCO Flow: Demonstration of Projections to N3 FinFET and Nanosheet Technologies.
Gerhard RzepaMarkus KarnerOskar BaumgartnerGeorg StrofFranz SchanovskyFerdinand MitterbauerChristian KernstockHui-Wen KarnerPieter WeckxGeert HellingsDieter ClaesZhicheng WuYang XiangThomas ChiarellaBertrand ParvaisJérôme MitardJacopo FrancoBen KaczerDimitri LintenZlatan StanojevicPublished in: IRPS (2021)