Reliability Characteristics of a High Density Metal- Insulator-Metal Capacitor on Intel's 10+ Process.

Cheyun Lin Uygar E. Avci M. A. Blount Rohit Grover Jeffery Hicks R. Kasim A. Kundu C. M. Pelto C. Ryder Anthony Schmitz K. Sethi D. Seghete D. J. Towner A. J. Welsh J. Weber C. Auth

Published in: IRPS (2020)

Keyphrases