Login / Signup

Effect of argon plasma treatment on electronic properties of doped hydrogenated Silicon thin films for photovoltaic applications.

Manmohan JainSucheta JunejaKalpana LodhiChander KantSushil KumarMohit JainAteet DuttYasuhiro Matsumoto
Published in: CCE (2021)
Keyphrases
  • thin film
  • plasma etching
  • solar cell
  • chemical vapor deposition
  • high density
  • room temperature
  • grain size
  • short circuit
  • high speed
  • multi layer
  • white light interferometry
  • neural network