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Room temperature plasma oxidation mechanism to obtain ultrathin silicon oxide and titanium oxide layers.
Julio C. Tinoco
Magali Estrada
G. Romero
Published in:
Microelectron. Reliab. (2003)
Keyphrases
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room temperature
thin film
plasma etching
chemical vapor deposition
high density
multi layer
silicon nitride
magnetic field
electron microscopy
low cost
thermal conductivity
np complete
heuristic search
selection mechanism