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High-density plasma chemical vapor deposition of silicon-based dielectric films for integrated circuits.
Son Van Nguyen
Published in:
IBM J. Res. Dev. (1999)
Keyphrases
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chemical vapor deposition
integrated circuit
high density
thin film
low density
close proximity
high bandwidth
magnetic recording
data center
high power
electron beam
plasma etching
field effect transistors
magnetic tape
database
computer simulation
cloud computing
artificial neural networks