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Heat stress exposing performance of deep-nano HK/MG nMOSFETs using DPN or PDA treatment.

Shea-Jue WangMu-Chun WangShuang-Yuan ChenWen-How LanBor-Wen YangL. S. HuangChuan-Hsi Liu
Published in: Microelectron. Reliab. (2015)
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