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Two-step annealing effects on ultrathin EOT higher-k (k = 40) ALD-HfO2 gate stacks.
Yukinori Morita
Shinji Migita
Wataru Mizubayashi
Meishoku Masahara
Hiroyuki Ota
Published in:
ESSDERC (2012)
Keyphrases
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leakage current
simulated annealing
post processing
electrical properties
database
multiscale
search algorithm
multi agent systems
low voltage
real time
learning algorithm
website
clustering algorithm
decision trees
room temperature
gate dielectrics