Optimization of 3D Stacked Nanosheets in 5nm Gate-all-around Transistor Technology.
Anil Kumar GunduVolkan KursunPublished in: SoCC (2021)
Keyphrases
- metal oxide semiconductor
- cmos technology
- low power
- low cost
- nm technology
- integrated circuit
- leakage current
- optimization algorithm
- high speed
- field effect transistors
- image sensor
- power dissipation
- global optimization
- power consumption
- rapid development
- low voltage
- silicon dioxide
- genetic algorithm
- personal computer
- case study
- information systems
- database
- digital signal processing
- technological advances
- optimization model
- key technologies
- optimization problems