Feature Extraction for Predictive Maintenance for Semiconductor Plasma Etching Equipment.
Shota UmedaRyoji AsakuraFumihiro GaMasahiro SumiyaPublished in: SICE (2023)
Keyphrases
- plasma etching
- feature extraction
- thin film
- low density
- high density
- pattern classification
- image processing
- software maintenance
- feature vectors
- wavelet transform
- preprocessing
- face recognition
- feature space
- support vector machine svm
- linear discriminant analysis
- texture analysis
- image classification
- pattern recognition
- image preprocessing
- extracted features
- discriminant analysis
- feature representation
- image feature extraction
- preventive maintenance
- manifold learning
- dimension reduction
- feature set
- face images
- feature selection
- computer vision
- texture classification
- neural network
- frequency domain
- predictive modeling
- extracting features
- artificial neural networks
- linear feature extraction