Investigation of Dielectric Pocket and Work function Engineering in Triple Material Hetero Gate Stack Oxide Double Gate TFET for Low Power Applications.
Priyanka KarmakarP. K. SahuPublished in: TENCON (2021)
Keyphrases
- low power
- cmos technology
- silicon dioxide
- leakage current
- low cost
- power consumption
- nm technology
- high speed
- low voltage
- single chip
- low power consumption
- field effect transistors
- electrical properties
- wireless transmission
- digital signal processing
- high power
- gate dielectrics
- logic circuits
- mixed signal
- parallel processing
- power dissipation
- general purpose
- signal processor
- vlsi circuits