Gate Insulator Utilizing Low Power Sputtering for Pt Gate Electrode Deposition.
Joong-Won ShinMasakazu TanumaShun'ichiro OhmiPublished in: IEICE Trans. Electron. (2022)
Keyphrases
- low power
- leakage current
- electrical properties
- metal oxide semiconductor
- low cost
- cmos technology
- power consumption
- image sensor
- high speed
- film thickness
- nm technology
- low voltage
- single chip
- gate insulator
- high power
- wireless transmission
- low power consumption
- thin film
- magnetic field
- vlsi architecture
- gate array
- real time
- mixed signal
- electric field
- digital signal processing
- energy efficiency
- power dissipation
- power reduction
- digital camera
- hardware and software