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Influence of rapid thermal annealing temperature on structure and electrical properties of high permittivity HfTiO thin film used in MOSFET.
Cong Ye
Chao Zhan
Jieqiong Zhang
Hao Wang
Tengfei Deng
Shiruo Tang
Published in:
Microelectron. Reliab. (2014)
Keyphrases
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electrical properties
film thickness
thin film
room temperature
silicon nitride
white light interferometry
simulated annealing
high temperature
solar cell
chemical vapor deposition
short circuit
databases
multi layer
high density
thermal imaging