Shigeki Nojima

Publication Activity (10 Years)

Years Active: 2013-2020
Publications (10 Years): 10

Top Topics

Cascade Classifier

Positive Semidefinite

Feature Generation

Top Venues

IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.

Publications

Wei Ye, Mohamed Baker Alawieh, Yuki Watanabe, Shigeki Nojima, Yibo Lin, David Z. Pan
TEMPO: Fast Mask Topography Effect Modeling with Deep Learning. ISPD (2020)
Yibo Lin, Meng Li, Yuki Watanabe, Taiki Kimura, Tetsuaki Matsunawa, Shigeki Nojima, David Z. Pan
Data Efficient Lithography Modeling With Transfer Learning and Active Data Selection. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 38 (10) (2019)
Xiaoqing Xu, Yibo Lin, Meng Li, Tetsuaki Matsunawa, Shigeki Nojima, Chikaaki Kodama, Toshiya Kotani, David Z. Pan
Subresolution Assist Feature Generation With Supervised Data Learning. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 37 (6) (2018)
Yibo Lin, Yuki Watanabe, Taiki Kimura, Tetsuaki Matsunawa, Shigeki Nojima, Meng Li, David Z. Pan
Data Efficient Lithography Modeling with Residual Neural Networks and Transfer Learning. ISPD (2018)
Yibo Lin, Meng Li, Yuki Watanabe, Taiki Kimura, Tetsuaki Matsunawa, Shigeki Nojima, David Z. Pan
Data Efficient Lithography Modeling with Transfer Learning and Active Data Selection. CoRR (2018)
Yoichi Tomioka, Tetsuaki Matsunawa, Chikaaki Kodama, Shigeki Nojima
Lithography hotspot detection by two-stage cascade classifier using histogram of oriented light propagation. ASP-DAC (2017)
Xiaoqing Xu, Tetsuaki Matsunawa, Shigeki Nojima, Chikaaki Kodama, Toshiya Kotani, David Z. Pan
A Machine Learning Based Framework for Sub-Resolution Assist Feature Generation. ISPD (2016)
Yukihide Kohira, Atsushi Takahashi, Tomomi Matsui, Chikaaki Kodama, Shigeki Nojima, Satoshi Tanaka
Manufacturability-aware mask assignment in multiple patterning lithography. APCCAS (2016)
Chikaaki Kodama, Hirotaka Ichikawa, Koichi Nakayama, Fumiharu Nakajima, Shigeki Nojima, Toshiya Kotani, Takeshi Ihara, Atsushi Takahashi
Self-Aligned Double and Quadruple Patterning Aware Grid Routing Methods. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 34 (5) (2015)
Yukihide Kohira, Tomomi Matsui, Yoko Yokoyama, Chikaaki Kodama, Atsushi Takahashi, Shigeki Nojima, Satoshi Tanaka
Fast mask assignment using positive semidefinite relaxation in LELECUT triple patterning lithography. ASP-DAC (2015)
Shigeki Nojima
Optical lithography extension with double patterning. ISPD (2013)
Chikaaki Kodama, Hirotaka Ichikawa, Koichi Nakayama, Toshiya Kotani, Shigeki Nojima, Shoji Mimotogi, Shinji Miyamoto, Atsushi Takahashi
Self-Aligned Double and Quadruple Patterning-aware grid routing with hotspots control. ASP-DAC (2013)