N. Ohtani

Publication Activity (10 Years)

Years Active: 2022-2023
Publications (10 Years): 2

Top Topics

Chemical Vapor Deposition

Top Venues

VLSI Technology and Circuits

Publications

N. Ishihara, Y. Shimada, T. Ochi, S. Seto, H. Matsuo, H. Yamashita, S. Morita, M. Ukishima, K. Uejima, Y. Arayashiki, S. Kajiwara, A. Murayama, K. Nishiyama, K. Sugimae, S. Mori, Y. Saito, T. Shundo, A. Maeda, H. Kamiya, Y. Uchiyama, M. Fujiwara, F. Aiso, K. Sekine, N. Ohtani
Highly Scalable Metal Induced Lateral Crystallization (MILC) Techniques for Vertical Si Channel in Ultra-High (> 300 Layers) 3D Flash Memory. VLSI Technology and Circuits (2023)
T. Morooka, T. Ishikawa, M. Komura, T. Kato, Y. Koyama, Y. Han, Y. Sugawara, D. Kuwabara, Y. Arayashiki, A. Murayama, K. Nishiyama, K. Sugimae, T. Ogura, H. Takeda, N. Kariya, Y. Goki, S. Konuma, Y. Kamiya, H. Yamashita, H. Shiga, K. Itagaki, R. Tanaka, T. Maeda, N. Ohtani, M. Fujiwara
Optimal Cell Structure/Operation Design of 3D Semicircular Split-gate Cells for Ultra-high-density Flash Memory. VLSI Technology and Circuits (2022)