Self-aligned double patterning layout decomposition with complementary e-beam lithography.
Jhih-Rong GaoBei YuDavid Z. PanPublished in: ASP-DAC (2014)
Keyphrases
- electron beam
- electron beam lithography
- integrated circuit
- decomposition algorithm
- decomposition method
- image decomposition
- x ray
- decomposition methods
- multi agent systems
- feature selection
- database
- social networks
- spatial layout
- data mining
- databases
- hierarchical decomposition
- intensity profile
- shape decomposition
- real time