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Study of doping of Ge0.96Si0.04: H films with B, and P during low frequency plasma deposition at low temperature.
Ismael Cosme
Andrey Kosarev
F. Temoltzi
A. Itzmoyotl
Published in:
CCE (2011)
Keyphrases
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low frequency
high frequency
chemical vapor deposition
wavelet transform
plasma etching
frequency domain
machine learning
image analysis
wavelet coefficients
subband
high density
low pass
electromagnetic fields