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Identification of a deposition rate profile subspace corresponding to spatially-uniform films in planetary CVD reactors: a new criterion for uniformity control.
Raymond A. Adomaitis
Published in:
Comput. Chem. Eng. (2005)
Keyphrases
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control system
electrical properties
plasma etching
optimal control
data sets
control method
chemical vapor deposition
neural network
high dimensional
dimensionality reduction
data acquisition
film thickness
clustering high dimensional data
permalloy films