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Modification of porous ultra-low K dielectric by electron-beam curing.
Cyril Guedj
G. Imbert
E. Martinez
Christophe Licitra
N. Rochat
V. Arnal
Published in:
Microelectron. Reliab. (2007)
Keyphrases
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electron beam
x ray
semiconductor devices
high speed
integrated circuit
design parameters
electron beam lithography
rough sets