Login / Signup

Numerical investigation of heat and mass transfer flow under the influence of silicon carbide by means of plasma-enhanced chemical vapor deposition vertical reactor.

Kamel Milani ShirvanRahmat EllahiTahereh Fanaie SheikholeslamiAmin Behzadmehr
Published in: Neural Comput. Appl. (2018)
Keyphrases
  • chemical vapor deposition
  • mass transfer
  • thin film
  • high density
  • fluid flow
  • plasma etching
  • heat transfer
  • flow field
  • computer vision
  • artificial neural networks
  • control system
  • data collection
  • control method