Reliability on EUV Interconnect Technology for 7nm and beyond.
Tae-Young JeongMiji LeeYunkyung JoJinwoo KimMin KimMyungsoo YeoJinseok KimHyunjun ChoiJoosung KimYoojin JoYongsung JiTaiki UemuraHai JiangDongkyun KwonHwaSung RheeSangwoo PaeBrandon LeePublished in: IRPS (2020)