Invited Paper: Extending Resolution Limits of IC Fabrication Technology: Demonstration by Device Fabrication and Circuit Performance.
Omkaram NalamasuPat G. WatsonRaymond A. CirelliJeff BudeIsik C. KizilyalliRoss A. KohlerPublished in: VLSI Design (2001)
Keyphrases
- integrated circuit
- semiconductor devices
- metal oxide semiconductor
- silicon on insulator
- electron beam lithography
- invited paper
- electron beam
- field effect transistors
- high speed
- high density
- cmos technology
- electronic devices
- case study
- artificial intelligence
- rapid development
- databases
- x ray
- information technology
- ibm power processor