Login / Signup

AlN-capped P-(AlxGal-x)2O3/Ga2O3 heterostructure field-effect transistors for near-junction thermal management of next generation power devices.

James Spencer LundhHannah N. MastenKohei SasakiAlan G. JacobsZhe ChengJoseph SpencerLei ChenJames C. GallagherAndrew D. KoehlerKeita KonishiSamuel GrahamAkito KuramataKarl D. HobartMarko J. Tadjer
Published in: DRC (2022)
Keyphrases